Angeline Chung

Aerial image metrology for OPC modeling and mask qualification

Peter De Bisschop, Ute Buttgereit, Ao Chen, 2017, European Mask and Lithography Conference.

OPC model prediction capability improvements by accounting for mask 3D-EMF effects

Thuy Do, John Sturtevant, Edita Tejnil, 2012, Advanced Lithography.

Source mask optimization using 3D mask and compact resist models

Neal Lafferty, Omar El-Sewefy, Jason Meiring, 2016, Advanced Lithography.

Evaluation of compact models for negative-tone development layers at 20/14nm nodes

Yunfei Deng, Yuri Granik, Dmitry Medvedev, 2015, Advanced Lithography.

Effective use of aerial image metrology for calibration of OPC models

John L. Sturtevant, Ute Buttgereit, Ao Chen, 2017, Advanced Lithography.