Ken-Ichi Mizusawa

Thin film type 248-nm bottom antireflective coatings

Yasuyuki Nakajima, Tomoyuki Enomoto, Keisuke Nakayama, 2003, SPIE Advanced Lithography.

Design considerations for bottom antireflective coating for 157 nm lithography

Rama Puligadda, Rikimaru Sakamoto, Ken-Ichi Mizusawa, 2002, SPIE Advanced Lithography.

Development of 193-nm organic BARC

Ken-Ichi Mizusawa, Takahiro Kishioka, Shinya Arase, 2001, SPIE Advanced Lithography.

Development of full-fill bottom antireflective coatings for dual-damascene process

James E. Lamb, Satoshi Takei, Xie Shao, 2001, SPIE Advanced Lithography.

Development of organic bottom antireflective coating for 157-nm lithography

Toshiro Itani, Rikimaru Sakamoto, Yasuyuki Nakajima, 2003, SPIE Advanced Lithography.

High-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Ken-Ichi Mizusawa, Shinya Arase, 2001, SPIE Advanced Lithography.

Recent Progress in Organic Bottom Anti-reflective Coatings

Rama Puligadda, Xie Shao, Ken-Ichi Mizusawa, 2001 .