Tomonori Aoyama

Work function modulation by segregation of indium through tungsten gate for dual-metal-gate complementary metal oxide semiconductor applications

Masato Koyama, Kazuhiro Eguchi, Kyoichi Suguro, 2007 .

Effects of Nitrogen Concentration and Post-treatment on Reliability of HfSiON Gate Dielectrics in Inversion States

Yoshitaka Tsunashima, Kazuhiro Eguchi, Katsuyuki Sekine, 2005 .

Ultrathin Ta2 O 5 Film Capacitor with Ru Bottom Electrode

T. Aoyama, Tomonori Aoyama, Soichi Yamazaki, 1998 .