Robert Birkner

发表

CD uniformity correction on 45-nm technology non-volatile memory

Erez Graitzer, Hiroyuki Miyashita, Ute Buttgereit, 2010, Advanced Lithography.

The flash memory battle: How low can we go?

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, SPIE Advanced Lithography.

Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

Peter De Bisschop, Vicky Philipsen, Andreas Erdmann, 2007, SPIE Photomask Technology.

Mask-Level Measurements Predict Imaging Performance for Flash Designs

Thomas Scherübl, Robert Birkner, Kees Grim, 2008 .

Process window improvement on 45nm technology non volatile memory by CD uniformity improvement

Erez Graitzer, Ute Buttgereit, Avi Cohen, 2010, Photomask Technology.

Mask tuning for process window improvement

Erez Graitzer, Ute Buttgereit, Avi Cohen, 2011, European Mask and Lithography Conference.

Characterizing the imaging performance of flash memory masks using AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, European Mask and Lithography Conference.

MeRiT repair verification using in-die phase metrology Phame

Ute Buttgereit, Robert Birkner, Robert Dipl Ing Stelzner, 2009, European Mask and Lithography Conference.

Mask CD control (CDC) using AIMS as the CD metrology data source

Erez Graitzer, Thomas Scheruebl, Robert Birkner, 2008, Photomask Japan.

Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements

Jo Finders, Ute Buttgereit, Thomas Scheruebl, 2010, Advanced Lithography.

Using the AIMS 45-193i for hyper-NA imaging applications

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2007, SPIE Photomask Technology.

Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping

Rainer Schmid, Axel M. Zibold, Robert Birkner, 2004, SPIE Photomask Technology.

Mask CD uniformity metrology for logic patterning and its correlation to wafer data

Ute Buttgereit, Frank Sundermann, Thomas Trautzsch, 2012, Other Conferences.

Extended process window using variable transmission PSM materials for 65 nm and 45 nm node

Ute Buttgereit, Mathias Irmscher, Corinna Koepernik, 2006, Photomask Japan.

The imaging performance of flash memory masks characterized with AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2009, Photomask Japan.

Wafer level CD metrology on photomasks using aerial imaging technology

Thomas Scherübl, Robert Birkner, Rigo Richter, 2008, Photomask Japan.

Phase behavior through pitch and duty cycle and its impact on process window

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2009, Photomask Japan.

Pupil plane analysis on AIMS 45-193i for advanced photomasks

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, SPIE Advanced Lithography.

Process window enhancement for 45-nm node using alterable transmission phase-shifting materials

Ute Buttgereit, Thomas Scheruebl, Mathias Irmscher, 2006, SPIE Photomask Technology.

Phase metrology on 45-nm node phase-shift mask structures

Ute Buttgereit, Sascha Perlitz, Malahat Tavassoli, 2008, SPIE Advanced Lithography.

Programmed defects study on masks for 45nm immersion lithography using the novel AIMS 45-193i

Thomas Scherübl, Robert Birkner, Rigo Richter, 2007, European Mask and Lithography Conference.

Phame: phase measurements on 45nm node phase shift features

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2008, Photomask Japan.

Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm

Erez Graitzer, Ute Buttgereit, Frank Sundermann, 2010, Advanced Lithography.

AIMS and resist simulation

Thomas Scherübl, Robert Birkner, Rigo Richter, 2008, Photomask Technology.

Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source

Erez Graitzer, Klaus Boehm, Robert Birkner, 2007 .