Martha I. Sanchez

发表

An analysis of EUV resist stochastic printing failures

Martha I. Sanchez, Gregory M. Wallraff, N. Megiddo, 2019, Photomask Technology.

High-NA lithographic imagery at Brewster's angle

Martha I. Sanchez, William D. Hinsberg, Timothy A. Brunner, 2002, SPIE Advanced Lithography.

Characterization of photoresist spatial resolution by interferometric lithography

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2003, SPIE Advanced Lithography.

Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2013, Advanced Lithography.

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 1999, Advanced Lithography.

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Breyta, Martha I. Sanchez, Gregory M. Wallraff, 1999, Advanced Lithography.

Using the critical ionization model for resist development to estimate contrast curves and roughening

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2003, SPIE Advanced Lithography.

Special Section Guest Editorial: Novel Patterning Technologies

Martha I. Sanchez, Eric M. Panning, 2018 .

Does line-edge roughness matter?: FEOL and BEOL perspectives

Charles T. Black, Martha I. Sanchez, Qinghuang Lin, 2003, SPIE Advanced Lithography.

ICE: Ionic contrast enhancement for organic solvent negative tone develop

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2014, Advanced Lithography.

Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

Yoshifumi Sakamoto, Takeshi Isogawa, Martha I. Sanchez, 2014, Photomask Technology.

Conductive layer for charge dissipation during electron-beam exposures

Thomas Faure, Shinpei Kondo, Martha I. Sanchez, 2012, Photomask Technology.

Impact of thin resist processes on post-etch LER

Hiroshi Ito, Martha I. Sanchez, Gregory M. Wallraff, 2003, SPIE Advanced Lithography.

Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2001, IBM J. Res. Dev..

Conductive layer for charge dissipation during electron-beam exposures

Martha I. Sanchez, Charles T. Rettner, Satoshi Watanabe, 2012, Other Conferences.

Liquid immersion lithography: evaluation of resist issues

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2004, SPIE Advanced Lithography.

Extendibility of chemically amplified resists: another brick wall?

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2003, SPIE Advanced Lithography.

EUV photoresist performance results from the VNL and the EUV LLC

Martha I. Sanchez, William D. Hinsberg, Jonathan L. Cobb, 2002, SPIE Advanced Lithography.

Fast calculation of images for high numerical aperture lithography

Ronald L. Gordon, Martha I. Sanchez, William D. Hinsberg, 2004, SPIE Advanced Lithography.

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 2000, Advanced Lithography.

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

Gregory Breyta, Martha I. Sanchez, Gregory M. Wallraff, 2000, Advanced Lithography.

DSA via hole shrink for advanced node applications

Nelson Felix, Kafai Lai, Martha I. Sanchez, 2016, SPIE Advanced Lithography.

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Martha I. Sanchez, Frances A. Houle, Robert D. Allen, 2007, SPIE Advanced Lithography.

Studies of acid diffusion in low Ea chemically amplified photoresists

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2005, SPIE Advanced Lithography.

Metrology, Inspection, and Process Control for Microlithography XXXI

Martha I. Sanchez, Vladimir A. Ukraintsev, 2017 .

High numerical aperture: imaging implications for chemically amplified photoresists

Martha I. Sanchez, William D. Hinsberg, Timothy A. Brunner, 2002, SPIE Advanced Lithography.

Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Martha I. Sanchez, William D. Hinsberg, Meyya Meyyappan, 2002, SPIE Advanced Lithography.

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

Martha I. Sanchez, Toru Komizo, Amy E. Zweber, 2013, Photomask Technology.

Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2011, Advanced Lithography.

Strategies to enable directed self-assembly contact hole shrink for tight pitches

Nelson Felix, Martha I. Sanchez, Cheng Chi, 2016, SPIE Advanced Lithography.

Contribution of EUV resist counting statistics to stochastic printing failures

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2021 .

High numerical aperture lithographic imagery at the Brewster angle

Martha I. Sanchez, William D. Hinsberg, Timothy A. Brunner, 2002 .

Nanoporous Polyimides Derived from Highly Fluorinated Polyimide/Poly(propylene Oxide) Copolymers

Martha I. Sanchez, Sally A. Swanson, Kenneth R. Carter, 2001 .

Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns

Martha I. Sanchez, William D. Hinsberg, Carl E. Larson, 2002 .

Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 1998 .

Acid–base reactions in a positive tone chemically amplified photoresist and their effect on imaging

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2004 .

Factors Controlling Pattern Formation in Chemically Amplified Resists at Sub-100 nm Dimensions.

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 1999 .

Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2002 .

AFM Characterization of Semiconductor Line Edge Roughness

Ndubuisi G. Orji, Martha I. Sanchez, Theodore V. Vorburger, 2004 .

Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2003 .

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2004 .

Product Volatilization as a Probe of the Physics and Chemistry of Latent Image Formation in Chemically Amplified Resists

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 2002 .

Kinetic Model for Positive Tone Resist Dissolution and Roughening

Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, 2002 .