Yusaku Uehara

Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node

Takayuki Funatsu, Yuichi Shibazaki, Akira Hayakawa, 2015, Advanced Lithography.

Thermal aberration control in projection lens

Tomoyuki Matsuyama, Taro Ogata, Yasuhiro Ohmura, 2008, SPIE Advanced Lithography.

An imaging system for extended ArF immersion lithography

Tomoyuki Matsuyama, Yasuhiro Ohmura, Toshiharu Nakashima, 2008, Lithography Asia.

An intelligent imaging system for ArF scanner

Tomoyuki Matsuyama, Taro Ogata, Yasuhiro Ohmura, 2008, SPIE Advanced Lithography.

Immersion and dry ArF scanners enabling 22nm HP production and beyond

Yuichi Shibazaki, Eiichiro Tanaka, Yusaku Uehara, 2012, Advanced Lithography.

Immersion scanners enabling 10nm half-pitch production and beyond

Takayuki Funatsu, Yuichi Shibazaki, Yosuke Shirata, 2014, Advanced Lithography.

A hyper-NA projection lens for ArF immersion exposure tool

Tomoyuki Matsuyama, Yasuhiro Ohmura, Yusaku Uehara, 2006, SPIE Advanced Lithography.

Thermal aberration control for low-k1 lithography

Noriaki Tokuda, Tomoyuki Matsuyama, Taro Ogata, 2007, SPIE Advanced Lithography.