Satoshi Ishiyama

Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node

Takayuki Funatsu, Yuichi Shibazaki, Akira Hayakawa, 2015, Advanced Lithography.

High-order aberration control during exposure for leading-edge lithography projection optics

Daisuke Inoue, Takahisa Kikuchi, Yasuhiro Ohmura, 2016, Advanced Lithography.

Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay

Tomoyuki Matsuyama, Yasuhiro Ohmura, Hajime Yamamoto, 2013, Advanced Lithography.

1549 Fundamental study on building LCC analysis with complete reusing and recycling system

Takatsune Kikuta, Tomoya Nishiwaki, Satoshi Ishiyama, 2012 .

Development and testing of a ventilator remote adapter via communication between ventilator and receiving smart device utilizing accompanying app.

Satoshi Ishiyama, Jun Yoshioka, Daiki Saitoh, 2018 .

Current status of high-index immersion lithography development

Yasuhiro Ohmura, Soichi Owa, Toshiharu Nakashima, 2007, SPIE Advanced Lithography.

An aberration control of projection optics for multi-patterning lithography

Tomoyuki Matsuyama, Taro Ogata, Yasuhiro Ohmura, 2011, Advanced Lithography.

Next-generation immersion scanner optimizing on-product performance for 7nm node

Yasuhiro Ohmura, Yuichi Shibazaki, Akira Hayakawa, 2016, Advanced Lithography.