L. Godet

Enhanced Performance of PMOS MUGFET via Integration of Conformal Plasma-Doped Source/Drain Extensions

R. Rooyackers, T. Skotnicki, N. Collaert, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

A novel plasma-based technique for conformal 3D FINFET doping

K. Han, L. Godet, C. Campbell, 2012, 2012 12th International Workshop on Junction Technology.

Ultra-shallow junction formation using flash annealing and advanced doping techniques

J. Gelpey, A. Kontos, D. Camm, 2008, Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08).

Ultra-low cost and high performance 65nm CMOS device fabricated with plasma doping

B. Tavel, P. Stolk, F. Arnaud, 2004, Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..