C.-S. Pai

Demonstration of integrated microscale optics in surface-electrode ion traps

Curtis Volin, Kenneth R. Brown, Kenneth Wright, 2011, 1105.4905.

Reliable transport through a microfabricated X-junction surface-electrode ion trap

Curtis Volin, Daniel L. Faircloth, Kenneth Wright, 2012, 1210.3655.

Is surface potential measurement (SPM) a useful charging damage measurement method?

J. T. Clemens, C.-T. Liu, H. Vaidya, 1998, 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100).

Controlling trapping potentials and stray electric fields in a microfabricated ion trap through design and compensation

Curtis Volin, Kenneth Wright, Jason M. Amini, 2012, 1204.4147.

High-dynamic range channelized MEMS equalizing filter

S. Chandrasekhar, S.H. Oh, A. Gasparyan, 2002, Optical Fiber Communication Conference and Exhibit.

Relationship between plasma damage, SILC and gate-oxide reliability

J. T. Clemens, J. F. Miner, C.-T. Liu, 1999, 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395).

Spatially uniform single-qubit gate operations with near-field microwaves and composite pulse compensation

Curtis Volin, Kenneth R. Brown, Jason M. Amini, 2013, 1304.6636.

Design of 25-nm SALVO PMOS devices

H.-H. Vuong, C.-S. Pai, C.-P. Chang, 2000, IEEE Electron Device Letters.