Kenneth E. Gonsalves

发表

Design and synthesis of novel resist materials for EUVL

Subrata Ghosh, Satinder K. Sharma, V. S. V. Satyanarayana, 2014, Advanced Lithography.

Resists for sub-100nm patterning at 193nm exposure

Mingxing Wang, Jeanette M. Roberts, Kenneth E. Gonsalves, 2006, SPIE Advanced Lithography.

New advances in resist system for next-generation lithography

Wei He, Kenneth E. Gonsalves, Yongqi Hu, 2001, SPIE Advanced Lithography.

All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Satinder K. Sharma, Kenneth E. Gonsalves, Rudra Kumar, 2020, Advanced Lithography.

Novel non-chemically amplified (n-CARs) negative resists for EUVL

Vikram Singh, Subrata Ghosh, Satinder K. Sharma, 2014, Advanced Lithography.

Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

Subrata Ghosh, Satinder K. Sharma, V. S. V. Satyanarayana, 2014 .

Nanopatterning : from ultralarge-scale integration to biotechnology : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A.

Daniel Herr, Marie Angelopoulos, Kenneth E. Gonsalves, 2002 .

High-sensitivity nanocomposite resist materials for x-ray and EUV lithography

Franco Cerrina, Kenneth E. Gonsalves, Nikola Batina, 2003, SPIE Advanced Lithography.

Effects of material design on extreme ultraviolet (EUV) resist outgassing

Kim Dean, Kenneth E. Gonsalves, Muthiah Thiyagarajan, 2006, SPIE Advanced Lithography.

Material design and evaluation of nanocomposite resist for next generation lithography

Clifford L. Henderson, Kim Dean, Kenneth E. Gonsalves, 2005, SPIE Advanced Lithography.

Organic-inorganic hybrid resists for EUVL

Subrata Ghosh, Satinder K. Sharma, V. S. V. Satyanarayana, 2014, Advanced Lithography.

Novel CA resists with photoacid generator in polymer chain

Kenneth E. Gonsalves, Hengpeng Wu, 2001, SPIE Advanced Lithography.

Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications

Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, 2018, Advanced Lithography.

BIORESIST: a lithographic approach for the patterning of cells in tissue engineering applications

Jae-Hak Choi, Kenneth E. Gonsalves, Wei He, 2004, SPIE Advanced Lithography.

Surface-controlled nanoscale materials for high-added-value applications : symposium held November 30-December 3, 1997, Boston, Massachusetts, U.S.A.

Kenneth E. Gonsalves, 1998 .

Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node

Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, 2018, Advanced Lithography.

Nanocomposite resist for low-voltage electron beam lithography (LVEBL)

Ankur Agrawal, Clifford L. Henderson, Kenneth E. Gonsalves, 2003, SPIE Advanced Lithography.

Newly developed polymer bound photoacid generator resist for sub-100-nm pattern by EUV lithography

Kim Dean, Kenneth E. Gonsalves, Muthiah Thiyagarajan, 2005, SPIE Advanced Lithography.

Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography

Jeanette M. Roberts, Wang Yueh, Kenneth E. Gonsalves, 2007, SPIE Advanced Lithography.

Focusing on nanoparticles-based photomultiplier in n-CARs

Satinder K. Sharma, Kenneth E. Gonsalves, Mohamad G. Moinuddin, 2020, Advanced Lithography.

Optimization of processing parameters and metrology for novel NCA negative resists for NGL

Subrata Ghosh, Satinder K. Sharma, V. S. V. Satyanarayana, 2014, Advanced Lithography.

Materials Issues and Modeling for Device Nanofabrication, Volume 584, Held November 29-December 2, 1999, Boston, Massachusetts, USA.

Kenneth E. Gonsalves, Mark F. Gyure, Lhadi Merhari, 1999 .

Development of metal-organic cluster based negative tone resist: pre-screened through the helium-ion beam prelude to extreme ultraviolet lithography (EUVL) applications

Kenneth E. Gonsalves, Satinder K. Sharma, Manvendra Chauhan, 2021, Advanced Lithography.

New polyoxometalates containing hybrid polymers and their potential for nano-patterning.

Subrata Ghosh, V. S. V. Satyanarayana, Kenneth E. Gonsalves, 2015, Chemistry.

Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography

Mingxing Wang, Clifford L. Henderson, Jeanette M. Roberts, 2006 .

Nanocomposite resist systems for next generation lithography

Wei He, Marie Angelopoulos, Wu-Song Huang, 2002 .

Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2008 .

Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography

Mingxing Wang, Clifford L. Henderson, Cheng-Tsung Lee, 2009 .

Homogeneous dispersion of nanostructured aluminum nitride in a polyimide matrix

Tongsan D. Xiao, Gan-Moog Chow, Kenneth E. Gonsalves, 1994 .

Micro/nanomachining of Polymer Surface for Promoting Osteoblast Cell Adhesion

Kenneth E. Gonsalves, Wei He, Nikola Batina, 2003 .

A Combinatorial Approach for the Synthesis and Characterization of Polymer/Vanadium Oxide Nanocomposites

Kenneth E. Gonsalves, Jianzhao Wang and, 1999 .

Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

Mingxing Wang, Jeanette M. Roberts, Wang Yueh, 2007 .

Novel Anionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Mingxing Wang, Jeanette M. Roberts, Wang Yueh, 2006 .

A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography

Subrata Ghosh, V. S. V. Satyanarayana, Kenneth E. Gonsalves, 2014 .

Recent advances in non-chemically amplified photoresists for next generation IC technology

Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep, 2016 .

Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep, 2016 .

New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2007 .

Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning

Mingxing Wang, Clifford L. Henderson, Jeanette M. Roberts, 2008 .

The Formation of Polymer Monolayers: From Adsorption to Surface Initiated Polymerizations

Kenneth E. Gonsalves, Dale L. Huber, K. Gonsalves, 1997 .

Novel Positive‐Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains

Hengpeng Wu, Kenneth E. Gonsalves, 2001 .

Infrared spectroscopic investigation of chemisorption on chemically synthesized aluminum nitride nanopowders with 2-pyrrolidinones

Kenneth E. Gonsalves, Marie-Isabelle Baraton, Xiaohe Chen, 1997 .

Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance

Mingxing Wang, Clifford L. Henderson, Cheng-Tsung Lee, 2007 .

High performance resist for EUV lithography

Paul Zimmerman, Kenneth E. Gonsalves, Nikola Batina, 2005 .

Towards novel non-chemically amplified (n-CARS) negative resists for electron beam lithography applications

Vikram Singh, Subrata Ghosh, V. S. V. Satyanarayana, 2014 .

Novel Ionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2007 .