K. Nguyen

Reflective Masks for Extreme Ultraviolet Lithography

K. Nguyen, 1994 .

Wavelength dependence of the resist sidewall angle in extreme ultraviolet lithography

D. Tennant, J. Kortright, A. MacDowell, 1994 .

At-Wavelength Metrologies for Extreme Ultraviolet Lithography

H. R. Beguiristain, E. Anderson, J. Bokor, 1998 .

Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography

Khanh Nguyen, Andrew R. Neureuther, David T. Attwood, 1993, Advanced Lithography.

Recent results in the development of an integrated EUVL laboratory tool

Richard H. Stulen, R. W. Arling, John E. Bjorkholm, 1995, Advanced Lithography.

Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Richard H. Stulen, Obert R. Wood, R. W. Arling, 1996, Advanced Lithography.

Imaging of extreme ultraviolet lithographic masks with programmed substrate defects

David T. Attwood, Hiroo Kinoshita, T. Haga, 1994 .