P.R. Varekamp

A high performance 0.13 /spl mu/m SOI CMOS technology with a 70 nm silicon film and with a second generation low-k Cu BEOL

G. Biery, S. Narasimha, J. Adkisson, 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

Breakdown measurements of ultra-thin SiO/sub 2/ at low voltage

A. Vayshenker, J. McKenna, E. Cartier, 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).