Shao-Ming Koh

N-Channel MOSFETs With Embedded Silicon–Carbon Source/Drain Stressors Formed Using Cluster-Carbon Implant and Excimer-Laser-Induced Solid Phase Epitaxy

Yee-Chia Yeo, K. Sekar, W. Krull, 2008, IEEE Electron Device Letters.

Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress

Luping Shi, Xiao Gong, Yee-Chia Yeo, 2009, 2009 International Semiconductor Device Research Symposium.

Contact Resistance Reduction for Strained N-MOSFETs With Silicon-Carbon Source/Drain Utilizing Aluminum Ion Implant and Aluminum Profile Engineering

Yee-Chia Yeo, Y. Yeo, Qian Zhou, 2013, IEEE Transactions on Electron Devices.

Self-aligned contact metallization technology for III-V metal-oxide-semiconductor field effect transistors

Chun-Yen Chang, Xiao Gong, Yee-Chia Yeo, 2011 .