Marie Hellion

Anticipation of dimensional issues caused by topography during photo lithography

Lionel Ravel, Christophe Brault, Chloé Hegaret, 2011, Photomask Technology.

Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

James W. Thackeray, George G. Barclay, Robert J. Kavanagh, 2002, SPIE Advanced Lithography.

Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists

Tatum Kobayashi, Marie Hellion, Tsutomu Tanaka, 2004, SPIE Advanced Lithography.