J. Romijn

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

Henry I. Smith, M. Peuker, M. H. Lim, 2002 .

A Schottky-Emitter Electron Source for Wide Range Lithography Applications

J. Romijn, Bert H. Koek, Thomas Chisholm, 1993 .

100 kV electron beam lithography using a Schottky field emission source

J. Somers, J. Romijn, J. Somers, 1994 .

DUV-E-beam mix and match lithography in a single mask for fabricating a multi-terminal SQUID device

E. van der Drift, J. Romijn, B. J. Vleeming, 1996 .

An electron beam lithography tool with a Schottky emitter for wide range applications

J. Romijn, Thomas Chisholm, B. H. Koek, 1994 .