Zhiqiang Liu

Double-grating lateral shearing interferometer for extreme ultraviolet lithography

Masanobu Hasegawa, Katsuhiko Murakami, Jun Saito, 2004 .

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

Masanobu Hasegawa, Akiyoshi Suzuki, Masahito Niibe, 2007, Applied optics.

Improved illumination system for spatial coherence control.

Mitsuo Takeda, Joseph Rosen, Takashi Gemma, 2010, Applied optics.

EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2006 .

Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2004 .