H. Zhuang

Novel Enhanced Stressor with Graded Embedded SiGe Source/Drain for High Performance CMOS Devices

J. Sudijono, D. Shum, J.J. Kim, 2006, 2006 International Electron Devices Meeting.

32nm general purpose bulk CMOS technology for high performance applications at low voltage

S. Samavedam, M. Sherony, F. Arnaud, 2008, 2008 IEEE International Electron Devices Meeting.

65nm cmos technology for low power applications

M. Sherony, T. Schiml, A. Cowley, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..