Joseph A. Felker

SCALPEL proof-of-concept system: preliminary lithography results

David L. Windt, Myrtle I. Blakey, Warren K. Waskiewicz, 1997, Advanced Lithography.

SCALPEL system

Myrtle I. Blakey, Warren K. Waskiewicz, Lloyd R. Harriott, 1994, Photomask Technology.

Alignment mark detection in CMOS materials with SCALPEL e-beam lithography

Gregg M. Gallatin, Myrtle I. Blakey, Isik C. Kizilyalli, 1999, Advanced Lithography.

Writing strategy for a high-throughput SCALPEL system

Warren K. Waskiewicz, Lloyd R. Harriott, James Alexander Liddle, 1999, Advanced Lithography.

Marks for SCALPEL® tool optics optimization

Gregg M. Gallatin, Myrtle I. Blakey, Isik C. Kizilyalli, 2000 .

The SCALPEL proof of concept system

Myrtle I. Blakey, Lloyd R. Harriott, Reginald C. Farrow, 1997 .

Preliminary results from a prototype projection electron‐beam stepper‐scattering with angular limitation projection electron beam lithography proof‐of‐concept system

David L. Windt, Myrtle I. Blakey, Lloyd R. Harriott, 1996 .