Stephen W. Bowler

SCALPEL proof-of-concept system: preliminary lithography results

David L. Windt, Myrtle I. Blakey, Warren K. Waskiewicz, 1997, Advanced Lithography.

Development of 157-nm small-field and mid-field microsteppers

Warren W. Flack, Stephen W. Bowler, Paul M. Bischoff, 2000, Advanced Lithography.

SCALPEL system

Myrtle I. Blakey, Warren K. Waskiewicz, Lloyd R. Harriott, 1994, Photomask Technology.

Electron-optical design for the SCALPEL proof-of-concept tool

Warren K. Waskiewicz, Lloyd R. Harriott, Masis M. Mkrtchyan, 1995, Optics & Photonics.

The SCALPEL proof of concept system

Myrtle I. Blakey, Lloyd R. Harriott, Reginald C. Farrow, 1997 .

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

David L. Windt, Myrtle I. Blakey, Warren K. Waskiewicz, 1995 .

Preliminary results from a prototype projection electron‐beam stepper‐scattering with angular limitation projection electron beam lithography proof‐of‐concept system

David L. Windt, Myrtle I. Blakey, Lloyd R. Harriott, 1996 .