Hoyoung Kang

Water immersion optical lithography at 193 nm

Neal Lafferty, Bruce W. Smith, Anatoly Bourov, 2004 .

New approaches in optical lithography technology for subwavelength resolution

Hoyoung Kang, 2005 .

Pattern Displacement Error Under Off-Axis Illumination

Nakgeuon Seong, Hoyoung Kang, Jongwook Kye, 1998, Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).

Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography

S. Han, K. No, B. Bae, 1997 .

Reliability characterization of advanced CMOS image sensor (CIS) with 3D stack and in-pixel DTI

Hoyoung Kang, Hyun-Chul Sagong, Junekyun Park, 2018, 2018 IEEE International Reliability Physics Symposium (IRPS).

Optical lithography at a 126-nm wavelength

Bruce W. Smith, Anatoly Bourov, Hoyoung Kang, 2001, SPIE Advanced Lithography.