N. Cheung

Characterization of contact and via failure under short duration high pulsed current stress

Kaustav Banerjee, A. Amerasekera, Chenming Hu, 1997, 1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual.

Contact-electromigration-induced leakage failure in aluminum-silicon to silicon contacts

W.G. Oldham, N. Cheung, J.G.-J. Chern, 1985, IEEE Transactions on Electron Devices.

Thermal analysis of the fusion limits of metal interconnect under short duration current pulses

A. Amerasekera, Chenming Hu, C. Hu, 1996, 1996 International Integrated Reliability Workshop Final Report.