J. L. Torres

Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

Joerg Butschke, Albrecht Ehrmann, Rainer Kaesmaier, 1999 .

Study of Equivalent Circuits of Piezoceramics to Use in Simulations with Pspice

J. L. Torres, A. Guisado, A. M. González, 2003 .

Ion absorbing stencil mask coatings for ion beam lithography

Martin C. Herbordt, Hans Loschner, John C. Wolfe, 1997 .

Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks

J. Wolfe, J. L. Torres, J. Wasson, 2000 .

High precision stress measurement of ion projection lithography mask membranes

P. Ruchhoeft, J. Wolfe, J. L. Torres, 2002 .

Photoresist removal using an O2∕N2 medium pressure plasma jet with high speed wafer scanning: Unimplanted resist studies

I. Berry, J. Wolfe, J. L. Torres, 2009 .

Scattering mask concept for ion-beam nanolithography

P. Ruchhoeft, R. Bass, J. Wolfe, 2002 .