Gerhard Gross

Projection maskless patterning for nanotechnology applications

Elmar Platzgummer, Hans Loeschner, Gerhard Gross, 2008 .

p-n junction-based wafer flow process for stencil mask fabrication

Roxann L. Engelstad, Edward G. Lovell, Joerg Butschke, 1998 .

Ion projection lithography: Status of the MEDEA project and United States/European cooperation

Rainer Kaesmaier, Hans Loschner, Gerhard Stengl, 1998 .

Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs

Elmar Platzgummer, Hans Loeschner, Falco C. M. J. M. van Delft, 2008 .