Bernd Loechel

Thick-layer resists for surface micromachining

Bernd Loechel, 2000 .

Application of ultraviolet depth lithography for surface micromachining

Martina Rothe, Andreas Maciossek, A. Maciossek, 1995 .

New negative-tone photoresists avoid swelling and distortion

Gabi Gruetzner, S. Fehlberg, Martina Rothe, 1997 .

SU-8: promising resist for advanced direct LIGA applications for high aspect ratio mechanical microparts

Gabi Gruetzner, Martin Bednarzik, Rainer Engelke, 2006 .

Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique

Gabi Gruetzner, Martin Bednarzik, Josef Mathuni, 2008 .