Sriram Balasubramanian

Selective Enhancement of SiO2 Etch Rate by Ar-Ion Implantation for Improved Etch Depth Control

Hideki Takeuchi, Xin Sun, H. Takeuchi, 2007 .

Circuit-Performance Implications for Double-Gate MOSFET Scaling below 25 nm

Borivoje Nikolic, Leland Chang, Tsu-Jae King, 2003 .

Fin Sidewall Microroughness Measurement by AFM

Tsu-Jae King, Weize Xiong, Carolyn F. H. Gondran, 2004 .

Nanoscale thin-body MOSFET design and applications

S. Balasubramanian, Sriram Balasubramanian, 2006 .