Eric Brause

Photoresist Stripping using Ozone/Deionized Water Chemistry

R. Novak, Ismail Kashkoush, Eric Brause, 1997 .

Removal of Backside Particles by a Single Wafer Megasonic System

H. Sohn, Jin-Goo Park, Changhae Park, 2007 .

Particulate Removal from Silicon Substrates in Megasonic-Assisted Dilute SC1 Chemistry

I. Kashkoush, R. Novak, Eric Brause, 1997 .

In-Situ Chemical Concentration control cor Wafer Wet Cleaning

I. Kashkoush, R. Novak, Eric Brause, 1997 .