I. Matko

Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH3

Sylvain Maitrejean, Bernard Guillaumot, S. Minoret, 2005 .

Reduced boron diffusion under interstitial injection in fluorine implanted silicon

Peter Ashburn, P. Ashburn, I. Matko, 2007 .

Development and functionalisation of Sb doped SnO2 thin films for DNA biochip applications

Carlotta Guiducci, Michel Labeau, O. Renault, 2006 .

Integration of a high density Ta2O5 MIM capacitor following 3D damascene architecture compatible with copper interconnects

Alexis Farcy, Sebastien Cremer, E. Deloffre, 2006 .