Shiying Xiong

Extremely scaled silicon nano-CMOS devices

Jeffrey Bokor, Shiying Xiong, Pushkar Ranade, 2003, Proc. IEEE.

Sensitivity of double-gate and FinFETDevices to process variations

J. Bokor, Shiying Xiong, 2003 .

Intrasubband electron-phonon scattering in doped thin-layer inserted quantum well

B. Gu, W. Duan, Shiying Xiong, 1997 .

Gate line-edge roughness effects in 50-nm bulk MOSFET devices

Shiying Xiong, Jeffrey Bokor, Qi Xiang, 2002, SPIE Advanced Lithography.

Converting normal insulators into topological insulators via tuning orbital levels

Yong Xu, W. Duan, Junwei Liu, 2015, 1511.00832.

Study of the extrinsic parasitics in nano-scale transistors

T. King, J. Bokor, Shiying Xiong, 2005 .