Yoshihiro Yamashita

Perfect-Selectivity Directional Etching of Silicon Using Ultraclean ECR Plasma

Tadahiro Ohmi, Hiroaki Uetake, Nobuo Mikoshiba, 1989 .

Directional etching of Si with perfect selectivity to SiO2 using an ultraclean electron cyclotron resonance plasma

Tadahiro Ohmi, Hiroaki Uetake, Nobuo Mikoshiba, 1990 .