J. C. J. van der Donck

Contamination control: removing small particles from increasingly large wafers

A. J. de Jong, J. C. J. van der Donck, T. Huijser, 2012, Advanced Lithography.

Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems

J. C. J. van der Donck, O. Brux, P. van der Walle, 2011, Photomask Technology.

Particle qualification procedure for the TNO EUV reticle load port module of the HamaTech MaskTrackPro cleaning tool

J. C. J. van der Donck, O. Brux, P. van der Walle, 2011, Advanced Lithography.

A multistep approach for reticle cleaning

A. J. de Jong, J. C. J. van der Donck, N. B. Koster, 2012, Advanced Lithography.

Optimized qualification protocol on particle cleanliness for EUV mask infrastructure

G. B. Derksen, J. C. J. van der Donck, J. K. Stortelder, 2011, Photomask Technology.

Deep sub-wavelength metrology for advanced defect classification

J. C. J. van der Donck, S. F. Pereira, P. van der Walle, 2017, Optical Metrology.

TNO reticle handling test platform

J. C. J. van der Donck, N. B. Koster, E. C. Fritz, 2014, Advanced Lithography.