Ernst-Bernhard Kley

发表

Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography

Thomas Käsebier, Jinyu Li, Ying Liu, 2016, SPIE/COS Photonics Asia.

High contrast gratings for high-precision metrology

Thomas Käsebier, Andreas Tünnermann, Stefanie Kroker, 2013, Photonics West - Optoelectronic Materials and Devices.

Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2005, SPIE Optical Systems Design.

Fabrication and properties of refractive micro-optical profiles for lenses, lens arrays, and beam-shaping elements

Lars-Christian Wittig, Ernst-Bernhard Kley, Matthias Cumme, 2000, International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT).

Highly efficient waveguide bends in low in-plane index contrast photonic crystals

Stefan Nolte, Andreas Tuennermann, Rumen Iliew, 2004, SPIE OPTO.

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Thomas Käsebier, Ying Liu, Keqiang Qiu, 2016, SPIE/COS Photonics Asia.

Alternative method of gray-tone lithography with potential for the fabrication of combined continuous 3D surface profiles and subwavelength structures

Lars-Christian Wittig, Tina Clausnitzer, Ernst-Bernhard Kley, 2003, SPIE Optics + Photonics.

Beam shaping for multimode beams

Stefan Nolte, Lars-Christian Wittig, Ernst-Bernhard Kley, 2001, SPIE Optics + Photonics.

Self-organized, effective medium black silicon antireflection structures for silicon optics in the mid-infrared

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2016, NanoScience + Engineering.

Investigation on the angular dependent reflectance of coupled high-contrast gratings

Thomas Käsebier, Andreas Tünnermann, Stefanie Kroker, 2014, Photonics West - Optoelectronic Materials and Devices.

Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements

Frank Wyrowski, Lars-Christian Wittig, Ernst-Bernhard Kley, 2003, SPIE Optics + Photonics.

Resist hardening without surface deviation

Ernst-Bernhard Kley, Matthias Cumme, Holger Hartung, 2003, SPIE Optics + Photonics.

Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Thomas Käsebier, Ernst-Bernhard Kley, Yannick Bourgin, 2016, Advanced Lithography.

Proximity printing by wave-optically designed masks

Frank Wyrowski, Lingli Wang, Ernst-Bernhard Kley, 2001, SPIE Optics + Photonics.

Polarizing metal stripe gratings for a micro-optical polarimeter

Tina Clausnitzer, Ernst-Bernhard Kley, Hans-Joerg Fuchs, 2003, SPIE Optics + Photonics.

Grating couplers in planar polymer waveguides with beam shaping properties

Peter Dannberg, Andreas H. Braeuer, Ernst-Bernhard Kley, 1994, Integrated Optoelectronics.

Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials

Ernst-Bernhard Kley, Matthias Falkner, Michael Banasch, 2014, European Mask and Lithography Conference.

Nanoporous SiO2 made by atomic layer deposition and atomic layer etching

Adriana Szeghalmi, Lilit Ghazaryan, Andreas Tünnermann, 2015, SPIE Optical Systems Design.

High-resolution proximity printing by wave-optically designed complex transmission masks

Frank Wyrowski, Lingli Wang, Ernst-Bernhard Kley, 2001, Microelectronic and MEMS Technologies.

Integration of high power laser diodes with microoptical components in a compact pumping source for visible fiber laser

Peter Schreiber, Bernd Hoefer, Anke Kraeplin, 1999, Photonics West.

Highly efficient polarization-independent transmission gratings for pulse stretching and compression

Tina Clausnitzer, Ernst-Bernhard Kley, Hans-Joerg Fuchs, 2004, SPIE Optical Systems Design.