Y.-H. Lin

Reliability, yield, and performance of a 90 nm SOI/Cu/SiCOH technology

J. Gill, C.-C. Yang, A. Carbone, 2004, Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729).

65nm cmos technology for low power applications

M. Sherony, T. Schiml, A. Cowley, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOL

J. Gill, C.-C. Yang, A. Carbone, 2004, 2004 IEEE International Reliability Physics Symposium. Proceedings.