S. Bollanti

High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser

P. Di Lazzaro, F. Flora, L. Mezi, 2003 .

Excimer-Laser-Driven EUV Plasma Source for Single-Shot Projection Lithography

P. Di Lazzaro, F. Flora, L. Mezi, 2009, IEEE Transactions on Plasma Science.

Point defects in lithium fluoride by EUV and soft X-rays exposure for X-ray microscopy and optical applications

P. Di Lazzaro, F. Flora, D. Murra, 2004, IEEE Journal of Selected Topics in Quantum Electronics.

Further comparisons between the conventional and the modified Schwarzschild objectives

P. Di Lazzaro, F. Flora, L. Mezi, 2008 .

Dominant role of dielectronic satellites in the radiation spectra of a laser plasma near the target surface

F. Flora, A. Grilli, T. A. Pikuz, 1997 .

Flight range of the particulate in a laser-plasma generated soft X-ray chamber

Cheng En Zheng, T. Letardi, S. Bollanti, 2000 .

Laser power stabilization by means of internal second harmonic generation

Paolo Mataloni, S. Bollanti, S. Di Fonzo, 1989 .

Effect of preionization on uniformity of photo-triggered XeCl laser discharges: modeling and comparison with experimental results

Cheng En Zheng, T. Letardi, T. Letardi, 1991 .

Conventional and modified Schwarzschild objective for EUV lithography: design relations

P. Di Lazzaro, F. Flora, L. Mezi, 2006 .