D. Sohn

Effect of temperature variation during post exposure bake on 193 nm chemically amplified resist simulation

Y. Sohn, Hye-keun Oh, D. Sohn, 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).

Simulation parameter effects on critical dimension and sensitivity of 193 nm Chemically Amplified Resist

Y. Sohn, Sang-Kon Kim, Hye-keun Oh, 2001, Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).

Relationship between normal heart size and body indices in Korean.

S. Y. Lee, D. Sohn, J. S. Seo, 2000, Journal of Korean medical science.