Eungsung Seo

Simulation parameter effects on critical dimension and sensitivity of 193 nm Chemically Amplified Resist

Y. Sohn, Sang-Kon Kim, Hye-keun Oh, 2001, Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).