K. Liu

A New Phenomenon of Retention Time Evolution in Embedded DRAM Technology with High-K Dielectrics (Ta2O5) MIM Capacitor After HTOL Test

R. F. Tsui, H. W. Chin, J. Shih, 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.

Magnetic thin-film inductors for monolithic integration with CMOS

Noah Sturcken, Kenneth Shepard, Michael S. Lekas, 2015, 2015 IEEE International Electron Devices Meeting (IEDM).