S. Hwang

发表

1/f Noise Characteristics of Sub-100 nm MOS Transistors

Jong-Ho Lee, Jong-Ho Lee, Sang-Yun Kim, 2006 .

Modeling of dry development in bilayer-resist process for 140-nm contact hole patterning

T. Edgar, S. Hwang, W. D. Kim, 2002 .

Oxidation of the TA Diffusion Barrier and Its Effect on the Reliability of CU Interconnects

J. Im, P. Ho, W. Baek, 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.

Characterization and integration of new porous low-k dielectric (k < 2.3) for 65 nm technology and beyond

J. H. Park, B. Min, Sang Jong Park, 2007 .

Dependency of 1/f Noise on Initial Oxidation Method in Nano-CMOS Technology

H. Lee, Kyungmin Kim, I. Cho, 2007 .

Stressmigration studies on dual damascene Cu/oxide and Cu/low k interconnects

P. Ho, S. Hwang, Jongsun Maeng, 2004 .

Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities

Christopher A. Bode, Juergen Hahn, Thomas F. Edgar, 2000, Autom..

Thermal Immune NiSi Technology for Nano-scale CMOSFETs

H. Lee, Yong-Jin Kim, I. Cho, 2006, International Workshop on Junction Technology.

Study of Multilayer FEP Characteristics Using Second Harmonic Generation Measurement

Seung-Han, Sung-Joo Hong, Kyung-do Kim, 2019 .

On-chip charge pumping method for characterization of interface states of ultra thin gate oxide in nano CMOS technology

H. Lee, Kyungmin Kim, I. Cho, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..