Stefan Doebereiner

CD metrology on OPC features using light optical and electron optical tools

Gerd Scheuring, Thomas Schaetz, Stefan Doebereiner, 2002, SPIE Photomask Technology.

Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool

Gordon Hughes, Thomas Struck, Gerd Scheuring, 2003, European Mask and Lithography Conference.

Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

Vicky Philipsen, Gerd Scheuring, Frank Hillmann, 2002, Photomask Technology.

HEXE observations of Cygnus X-1.

Claus Reppin, Joachim E. Truemper, Peter Kretschmar, 1995 .

Hard X-Ray Observations of Vela X-1 and A0535+26 with HEXE: Discovery of Cyclotron Lines

Claus Reppin, Joachim E. Truemper, Peter Kretschmar, 1992 .