V. Vasilyev

发表

A ZVS/ZCS Hybrid Driver Integrated Circuit in 250 nm BCD Technology for Energy-Efficient Switch Mode Power Supply Units

A. A. Antonov, Igor V. Pichugin, Igor K. Surin, 2018, 2018 XIV International Scientific-Technical Conference on Actual Problems of Electronics Instrument Engineering (APEIE).

Application of finite element models for design of high-precision MEMS pressure sensors

V. Vasilyev, V. A. Gridchin, M. A. Chebanov, 2014, 2014 12th International Conference on Actual Problems of Electronics Instrument Engineering (APEIE).

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

T. Basova, A. Hassan, V. Vasilyev, 2015 .

Nucleation and Growth of Pulsed CVD Ru Films from Tricarbonyl[η 4-cyclohexa-1,3-diene]ruthenium

Y. Song, V. Vasilyev, K. Mogilnikov, 2008 .

Low-temperature pulsed CVD of ruthenium thin films for micro- and nanoelectronic applications, Part 1: Equipment and methodology

V. Vasilyev, 2010 .

Chemical vapour-phase deposition of ruthenium-containing thin films

V. Vasilyev, I. Igumenov, N. Morozova, 2014 .

Review—Mechanical Stress in Chemically Vapor Phase Deposited Boron- and Phosphorus-Contained Silicate Glass Thin Films: A Review

G. Kittilsland, V. Vasilyev, 2020 .

Estimating the Interrelation between the Rate of Atomic Layer Deposition of Thin Platinum-Group Metal Films and the Molecular Mass of Reactant Precursors

V. Vasilyev, 2019, Russian Microelectronics.

Structure, composition, and electrical resistance of thin ruthenium metallic layers obtained by pulsed chemical vapor deposition

V. Vasilyev, 2017, Journal of Structural Chemistry.

Low-temperature pulsed vapor-phase deposition of thin layers of metal ruthenium for micro- and nanoelectronics. Part 5. Interrelation of growth regularities, structure, and properties of ruthenium layers

V. Vasilyev, 2011 .

Low-temperature pulsed vapor-phase deposition of thin ruthenium metal layers for microelectronics and nanoelectronics. Part 4: The structure and basic properties of ruthenium layers

V. Vasilyev, 2011 .

Low-temperature pulsed CVD of thin layers of metallic ruthenium for microelectronics and nanoelectronics. Part 3: Nucleation phenomena during the growth of ruthenium layers

V. Vasilyev, 2010 .

Low temperature pulsed gas-phase deposition of thin layers of metallic ruthenium for micro- and nanoelectronics: Part 2. Kinetics of the growth of ruthenium layers

V. Vasilyev, 2010 .

Properties of thermally annealed ruthenium thin films grown on seed layers in a low-temperature selective deposition region

Y. Song, V. Vasilyev, K. Mogilnikov, 2009 .

Surface Selective Growth of Ruthenium Films under Low-Temperature Pulsed CVD Conditions

Y. Song, V. Vasilyev, K. Mogilnikov, 2008 .

Evaluation of Low Temperature TEOS-Ozone Silicon Dioxide Thin Film CVD under Sub-Atmospheric Pressure Using Consecutively Pulsed Reactant Injection

V. Vasilyev, 2015 .

historical outline on the treatMent of Pa tients with chronic PosttrauMatic instability of shoulder joint (review of literature)

V. Vasilyev, V. Monastyrev, N. Tishkov, 2013 .

2D modeling of photoelectric part of silicon pressure sensor

A. S. Chernov, V. Vasilyev, V. A. Gridchin, 2014, 2014 15th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM).

Review—Atomic Layer Deposition of Silicon Dioxide Thin Films

V. Vasilyev, 2021 .

Chemical Vapor Deposition of Ir‐Based Coatings: Chemistry, Processes and Applications

T. Basova, A. Hassan, V. Vasilyev, 2015 .