A. Aarnink

发表

Low-resistivity α-phase tungsten films grown by hot-wire assisted atomic layer deposition in high-aspect-ratio structures

Jurriaan Schmitz, Alexeij Y. Kovalgin, Mengdi Yang, 2018 .

A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing

J. Timmermans, M. Chefdeville, D. Altpeter, 2006, 2006 European Solid-State Device Research Conference.

THE GRIDPIX DETECTOR: HISTORY AND PERSPECTIVE

N. Bakel, M. Beuzekom, A. Colijn, 2013 .

Low-Stress Highly-Conductive In-Situ Boron Doped Ge0.7Si0.3 Films by LPCVD

J. Schmitz, A. Kovalgin, C. Salm, 2012 .

Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

Anubha A. Gupta, M. Nguyen, A. Kovalgin, 2015 .

Thermal Atomic Layer Deposition of Polycrystalline Gallium Nitride

A. Kovalgin, D. Gravesteijn, Souri Banerjee, 2019, The Journal of Physical Chemistry C.

Inherently area-selective hot-wire assisted atomic layer deposition of tungsten films

J. Schmitz, A. Kovalgin, A. Kovalgin, 2018 .

Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor

R. Wolters, J. Schmitz, A. Kovalgin, 2016 .

Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System

R. Wolters, A. Kovalgin, A. Kovalgin, 2013 .

Effects of Oxygen, Nitrogen and Fluorine on the Crystallinity of Tungsten by Hot-Wire Assisted ALD

R. Wolters, J. Schmitz, A. Kovalgin, 2017 .

Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices

R. Wolters, J. Schmitz, A. Kovalgin, 2007 .

Self-limiting growth and thickness- and temperature-dependence of optical constants of ALD AlN thin films

M. Nguyen, A. Kovalgin, H. Bui, 2014 .

Study of the phase nature of boron- and nitrogen-containing films by optical and photoelectron spectroscopy

A. J. Onnink, A. Kovalgin, D. Gravesteijn, 2020, Journal of Vacuum Science & Technology B.

Single-hole tunneling through a two-dimensional hole gas in intrinsic silicon

W. G. van der Wiel, F. Mueller, F. Zwanenburg, 2013, 1304.2870.

Hot‐wire assisted ALD of tungsten films: In‐situ study of the interplay between CVD, etching, and ALD modes

R. Wolters, J. Schmitz, A. Kovalgin, 2015 .

Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD

R. Wolters, J. Schmitz, A. Kovalgin, 2007 .

On the Verification of EEDFs in Plasmas with Silane using Optical Emission Spectroscopy

R. Wolters, J. Schmitz, A. Aarnink, 2007 .

Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy

R. Wolters, J. Schmitz, A. Kovalgin, 2006 .

Atomic Layer Deposition of W1.5N Barrier Films for Cu Metallization: Process and Characterization

R. Wolters, J. Holleman, S. Bystrova, 2005 .

Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry

R. Wolters, J. Schmitz, A. Kovalgin, 2011 .

From Single Atoms to Nanoparticles: Autocatalysis and Metal Aggregation in Atomic Layer Deposition of Pt on TiO2 Nanopowder.

M. Kreutzer, P. Kooyman, A. Kovalgin, 2018, Small.

Composite GaN–C–Ga (“GaCN”) Layers with Tunable Refractive Index

A. J. Onnink, A. Kovalgin, S. Dutta, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia

A. J. Onnink, A. Kovalgin, D. Gravesteijn, 2020, Journal of Vacuum Science & Technology A.

PEALD AlN: controlling growth and film crystallinity

J. Schmitz, R. Kruijs, A. Kovalgin, 2015 .

Thin-film (Al)BCN materials synthesized by sequential precursor pulses to mimic atomic layer deposition

A. Kovalgin, D. Gravesteijn, A. Aarnink, 2023, AIP Advances.

Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films

Feng Liu, Christopher James Lee, Fred Bijkerk, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry

R. Wolters, S. Kinge, A. Kovalgin, 2017 .

In-situ RHEED analysis of atomic layer deposition and characterization of Al203 gate dielectrics

J. Schmitz, J. Holleman, A. Aarnink, 2003 .

Charge carrier transport and electroluminescence in atomic layer deposited poly-GaN/c-Si heterojunction diodes

R. Hueting, J. Schmitz, A. Kovalgin, 2018, Journal of Applied Physics.

Thermal atomic layer deposition and oxidation of TiN monitored by in-situ spectroscopic ellipsometry

R. Wolters, J. Schmitz, A. Kovalgin, 2009 .

Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride

A. Kovalgin, A. Aarnink, Bernhard Y. van der Wel, 2023, The Journal of Physical Chemistry C.

Low-resistivity molybdenum obtained by atomic layer deposition

R. Wolters, A. Kovalgin, D. Gravesteijn, 2023, Journal of Vacuum Science & Technology A.

Barrier Properties of ALD W 1 . 5 N Thin Films

R. Wolters, J. Holleman, S. Bystrova, 2010 .

Hot Wire ALD: Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry (Adv. Mater. Interfaces 18/2017)

R. Wolters, S. Kinge, A. Kovalgin, 2017 .

Conduction and Electric Field Effect in Ultra-Thin Tungsten Films

J. Schmitz, A. Kovalgin, A. Aarnink, 2020, IEEE Transactions on Semiconductor Manufacturing.

Electrical characterization of hot-wire assisted atomic layer deposited Tungsten films

J. Schmitz, A. Kovalgin, A. Aarnink, 2019, 2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS).