J. E. Meerakker

发表

Etching of Deep Macropores in 6 in. Si Wafers

F. Roozeboom, R. Elfrink, J. Verhoeven, 2000 .

Kinetic and Diffusional Aspects of the Dissolution of Si in HF Solutions

M. Mellier, J. E. Meerakker, 2001 .

Silicon Etching in CrO3 ‐ HF Solutions I . High Ratios

J. E. Meerakker, J. V. Vegchel, 1989 .

On the mechanism of electroless plating. I. Oxidation of formaldehyde at different electrode surfaces

J. E. Meerakker, 1981 .

The reduction of hydrogen peroxide at silicon in weak alkaline solutions

J. E. A. M. van den Meerakker, J. E. Meerakker, 1990 .

The Reduction of Hydrogen Peroxide at Silicon in Weak Alkaline Solutions

J. E. Meerakker, 1990 .

The Minority Carrier Recombination Resistance: A Useful Concept in Semiconductor Electrochemistry

P. Notten, J. Kelly, J. E. Meerakker, 1985 .

(Photo)electrochemical characterization of tin‐doped indium oxide

J. E. Meerakker, E. Meulenkamp, M. Scholten, 1993 .

The reduction of iodine at GaAs: the role of potential-redistribution at the semi-conductor/electrolyte interface

J. E. Meerakker, 1985 .

Anodic silicon etching; the formation of uniform arrays of macropores or nanowires

F. Roozeboom, R. Elfrink, J. E. Meerakker, 2003 .

On the mechanism of electroless plating. II. One mechanism for different reductants

J. E. Meerakker, 1981 .

The behaviour of permalloy in NH4F/HF solutions

P. C. Baarslag, J. E. Meerakker, 2000 .

On the mechanism of electroless plating. Part 3. Electroless copper alloys

J. E. Meerakker, J. Bakker, 1990 .

The etching of Ti adhesion layers in H2O2 solutions

J. B. Giesbers, J. E. Meerakker, J. Metsemakers, 2002 .

An electrochemical and X-ray photoelectron spectroscopic study into the mechanism of Ti+W alloy etching in H2O2 solutions

J. E. Meerakker, M. Scholten, T. Thijssen, 1992 .

The etching of Ti-W in concetrated H2O2 solutions

J. E. Meerakker, M. Scholten, J. J. V. Oekel, 1992 .

Reductive Corrosion of ITO in Contact with Al in Alkaline Solutions

W. T. Veen, J. E. Meerakker, 1992 .

On the homogeneity of sputter-deposited ITO films Part II. Etching behaviour

T. J. Vink, P. C. Baarslag, J. E. Meerakker, 1995 .

Reductive Corrosion of ITO in Contact with Al in Alkaline Solutions.

W. T. Veen, J. E. Meerakker, 1992 .

The electrochemistry of alkaline K3Cr(CN)6 solutions at p-GaAs

J. E. Meerakker, 1988 .

Chemomechanical silicon polishing : electrochemical in situ measurements

G. Spierings, J. E. Meerakker, W. L. C. M. Heyboer, 1991 .

Kinetics and Morphology of GaAs Etching in Aqueous CrO3 ‐ HF Solutions

J. Weyher, J. V. D. Ven, J. Kelly, 1986 .

On the Mechanism of ITO Etching: The Specificity of Halogen Acids

J. E. Meerakker, M. Scholten, 1993 .

On the Mechanism of ITO Etching in Halogen Acids: The Influence of Oxidizing Agents

P. C. Baarslag, J. E. Meerakker, M. Scholten, 1995 .

On the homogeneity of sputter-deposited ITO films Part I. Stress and microstructure

Teunis Johannes Vink, J. E. A. M. van den Meerakker, J. L. C. Daams, 1995 .

A Mechanistic Study of Silicon Etching in NH 3 / H 2 O 2 Cleaning Solutions

J. E. A. M. van den Meerakker, M. H. M. van der Straaten, J. E. Meerakker, 1990 .

Kinetics and Morphology of GaAs Etching in Aqueous CrO3- HF Solutions.

J. Weyher, J. V. D. Ven, J. Kelly, 1986 .

Wet-chemical etching of III-V semiconductors

P. Notten, J. Kelly, J. E. Meerakker, 1988 .

High-density, low-loss MOS capacitors for integrated RF decoupling

Fred Roozeboom, R. J. G. Elfrink, Th. G. S. M. Rijks, 2001 .

The Mechanism of GaAs Etching in CrO3 ‐ HF Solutions I . Experimental Results

J. V. D. Ven, J. Kelly, J. E. Meerakker, 1985 .

The Mechanism of GaAs Etching in CrO3 ‐ HF Solutions II . Model and Discussion

J. V. D. Ven, J. Kelly, J. E. Meerakker, 1985 .