G. K. Belmonte

EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer

Kenneth E. Gonslaves, D. Weibel, C. A. Moura, 2018, RSC advances.

EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

D. Weibel, K. Gonsalves, C. A. Moura, 2018, Journal of Photochemistry and Photobiology A: Chemistry.

Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation

D. Weibel, K. Gonsalves, S. Sharma, 2020 .

Permanent hydrophilic modification of polypropylene and poly(vinyl alcohol) films by vacuum ultraviolet radiation

D. Weibel, M. Strumia, G. K. Belmonte, 2016 .

Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

D. Weibel, K. Gonsalves, C. A. Moura, 2018, The Journal of Physical Chemistry C.

Selective Fragmentation of Radiation-Sensitive Novel Polymeric Resist Materials by Inner-Shell Irradiation.

F. Kessler, D. Weibel, K. Gonsalves, 2015, ACS applied materials & interfaces.

Highly Water-Stable Polymer-Perovskite Nanocomposites.

D. Weibel, F. Rodembusch, G. K. Belmonte, 2021, ACS applied materials & interfaces.