A. Metz

发表

Indium-cadmium-oxide films having exceptional electrical conductivity and optical transparency: Clues for optimizing transparent conductors

A. Freeman, R. Asahi, T. Marks, 2001, Proceedings of the National Academy of Sciences of the United States of America.

High‐Performance Organic Light‐Emitting Diodes Using ITO Anodes Grown on Plastic by Room‐ Temperature Ion‐Assisted Deposition

Mark E. Madsen, S. Ho, T. Marks, 2004 .

Transparent conducting oxides: texture and microstructure effects on charge carrier mobility in MOCVD-derived CdO thin films grown with a thermally stable, low-melting precursor.

T. Marks, C. Stern, K. Poeppelmeier, 2004, Journal of the American Chemical Society.

Dopant ion size and electronic structure effects on transparent conducting oxides. Sc-doped CdO thin films grown by MOCVD.

A. Freeman, J. Medvedeva, T. Marks, 2004, Journal of the American Chemical Society.

Development and Implementation of New Volatile Cd and Zn Precursors for the Growth of Transparent Conducting Oxide Thin Films Via Mocvd

T. Marks, N. Edleman, J. Babcock, 2000 .

Transport currents in Bi-2223/Ag tapes made using the tape-in-rectangular tube process, current distribution and Ic stress degradation

P. Kováč, B. Haken, A. Metz, 2002 .

Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

T. Marks, C. Stern, N. Edleman, 2000 .

MOCVD-derived highly transparent, conductive zinc- and tin-doped indium oxide thin films: precursor synthesis, metastable phase film growth and characterization, and application as anodes in polymer light-emitting diodes.

T. Marks, C. Stern, C. Kannewurf, 2005, Journal of the American Chemical Society.

Advanced multiple patterning technologies for high density hexagonal hole arrays

Akiteru Ko, Peter Biolsi, Sophie Thibaut, 2021, Advanced Lithography.

Synthesis and characterization of volatile, fluorine-free beta-ketoiminate lanthanide MOCVD precursors and their implementation in low-temperature growth of epitaxial CeO(2) buffer layers for superconducting electronics.

M. Chudzik, T. Marks, R. Chang, 2002, Inorganic chemistry.

Bis[di(2,2,2‐trifluoroethyl)dithiocarbamato]CuII: A Volatile Precursor for the Efficient Growth of Cuprous Sulfide Films by MOCVD

T. Marks, C. Stern, A. Metz, 2005 .

Plasma etch patterning of EUV lithography: balancing roughness and selectivity trade off

Lei Sun, Andrew Metz, Matthew E. Colburn, 2016, SPIE Advanced Lithography.

MOCVD Growth of Transparent Conducting Cd2SnO4 Thin Films

T. Marks, K. Poeppelmeier, C. Kannewurf, 2004 .

Tuning the properties of transparent oxide conductors. Dopant ion size and electronic structure effects on CdO-based transparent conducting oxides. Ga- and in-doped CdO thin films grown by MOCVD

A. Freeman, J. Medvedeva, M. Hersam, 2008 .

CdO as the archetypical transparent conducting oxide. Systematics of dopant ionic radius and electronic structure effects on charge transport and band structure.

Tobin J Marks, Shu Jin, Mark C Hersam, 2005, Journal of the American Chemical Society.

Two- and three-dimensional connectivity and current distribution in YBa2Cu3Ox-coated conductors

H. Kate, B. T. Haken, J. Schwartz, 2005 .

Direct experimental analysis of the relation between the grain structure and the distribution of critical current density in YBa2Cu3Ox coated conductors

B. Ten Haken, J. Schwartz, H. T. Ten Kate, 2005 .

Lattice location and magnetism of Fe and Sc impurities in Gd and Tb single crystals

W. Brewer, A. Metz, D. Riegel, 1995 .

Highly transparent and conductive CdO thin films as anodes for organic light‐emitting diodes: Film microstructure and morphology effects on performance

Jun Ni, Yu Yang, Tobin J. Marks, 2005 .

Highly Transparent and Conductive CdO Thin Films as Anodes for Organic Light-Emitting Diodes

T. Marks, Qinglan Huang, A. Metz, 2005 .

New low-melting cadmium precursors for the detailed study of texture effects in MOCVD derived CdO thin-films

T. Marks, K. Poeppelmeier, C. Kannewurf, 2002 .

Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

K. Nafus, Y. Feurprier, S. Nagahara, 2022, Advanced Lithography.

EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

Akiteru Ko, Peter Biolsi, Danilo De Simone, 2018, Advanced Lithography.

DSA patterning options for logics and memory applications

Akiteru Ko, John Arnold, Nelson Felix, 2017, Advanced Lithography.

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Yongan Xu, John Arnold, Nelson Felix, 2017, Advanced Lithography.

DSA via hole shrink for advanced node applications

Nelson Felix, Kafai Lai, Martha I. Sanchez, 2016, SPIE Advanced Lithography.

First-principles calculations for understanding high conductivity and optical transparency in InxCd1−xO films

A. Freeman, R. Asahi, T. Marks, 2002 .

Experiments on the Magnetism of Sc Implanted into Metals

W. Brewer, A. Metz, D. Riegel, 2001 .

Plasma etch selectivity study and material screening for self-aligned gate contact (SAGC)

Andrew Metz, Farid Sebaai, Steven Demuynck, 2019, Advanced Lithography.

Improvement of self-aligned dual patterning using spin-on-carbon mandrel

Peter Biolsi, Sophie Thibaut, Andrew Metz, 2020, Advanced Lithography.