Ronald Goossens

Model-based scanner tuning for process optimization

Xu Xie, Yu Cao, Venu Vellanki, 2011, European Mask and Lithography Conference.

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Anton Devilliers, Junwei Lu, Xu Xie, 2010, Advanced Lithography.

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Peter Engblom, 2013, Advanced Lithography.

A physical resist shrinkage model for full-chip lithography simulations

Xin Guo, Gary Zhang, Qian Zhao, 2016, SPIE Advanced Lithography.

Scanner-to-scanner CD analysis and control in an HVM environment

Austin Peng, Ronald Goossens, Young Seog Kang, 2017, Advanced Lithography.

Topological and model based approach to pitch decomposition for double patterning

Natalia Davydova, Ronald Goossens, Peter Nikolsky, 2008, European Mask and Lithography Conference.

Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

Anton van Oosten, Ronald Goossens, Judy Huckabay, 2007, SPIE Photomask Technology.

Advanced scanner matching using freeform source and lens manipulators

Junwei Lu, Yu Cao, Zhengfan Zhang, 2011, Advanced Lithography.