Andrew Grenville

发表

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2016, SPIE Advanced Lithography.

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Advanced Lithography.

Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

Vladimir Liberman, Paul Zimmerman, Mordechai Rothschild, 2007, SPIE Advanced Lithography.

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Vladimir Liberman, Roger H. French, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

High-index optical materials for 193nm immersion lithography

Chris Van Peski, Simon G. Kaplan, John H. Burnett, 2006, SPIE Advanced Lithography.

Integrated fab process for metal oxide EUV photoresist

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2015, Advanced Lithography.

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2016, SPIE Advanced Lithography.

Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography

Christoph Hohle, Manuela Gutsch, Andrew Grenville, 2012, Other Conferences.

Directly patterned inorganic hardmask for EUV lithography

Patrick P. Naulleau, Douglas A. Keszler, Christopher N. Anderson, 2011, Advanced Lithography.

Damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Chris K. Van Peski, 1998, Advanced Lithography.

Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation)

Michael Kocsis, Andrew Grenville, Benjamin L. Clark, 2020 .

Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion

Chris Van Peski, Peter De Bisschop, Richard Bruls, 2004, SPIE Advanced Lithography.

Experimental and Numerical Studies of the Response of Photomask Hard Pellicles to Acoustic Excitation

Roxann L. Engelstad, Edward G. Lovell, Chris K. Van Peski, 2002, Photomask Technology.

Initial assessment of the lithographic impact of the use of hard pellicles: an overview

Chris Van Peski, Peter De Bisschop, Richard Bruls, 2004, SPIE Advanced Lithography.

Testing of optical materials for 193-nm applications

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Optics & Photonics.

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Andreas Frommhold, Yasin Ekinci, Alex P. G. Robinson, 2016 .

Coater/developer process integration of metal-oxide based photoresist

Takashi Saito, Michael Greer, Richard Farrell, 2015, Advanced Lithography.

Hard pellicle investigation for 157-nm lithography: impact on overlay

Peter De Bisschop, Roxann L. Engelstad, Richard Bruls, 2004, European Mask and Lithography Conference.

The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm

Dominic Ashworth, Ken Goldberg, Rene Claus, 2012, Advanced Lithography.

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Chris Van Peski, Roxann L. Engelstad, Alexander C. Wei, 2004, SPIE Photomask Technology.

Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Andreas Frommhold, Yasin Ekinci, Roberto Fallica, 2016, SPIE Advanced Lithography.

Advances in defect performance in metal oxide photoresists for EUV lithography

Geert Vandenberghe, Amrit Narasimhan, Peter De Schepper, 2021 .

Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Gregory Nellis, Alexander C. Wei, Mohamed El-Morsi, 2006 .

Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography

Christoph Hohle, Kang-Hoon Choi, Manuela Gutsch, 2012 .

Recent Trends in Optical Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2004 .

Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, 1999 .

Studies of consequences of photo-acid generator leaching in 193nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2006, SPIE Advanced Lithography.

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Kevin J. Orvek, Mordechai Rothschild, 2001 .

Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2007 .

Liquid immersion lithography: Why, how, and when?

Roderick R. Kunz, Vladimir Liberman, Theodore M. Bloomstein, 2004 .

Measurements of the dynamic contact angle for conditions relevant to immersion lithography

Gregory Nellis, Scott D. Schuetter, Andrew Grenville, 2006 .