Aleks Aidla

发表

Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1 '-methyl-ruthenocene

Marianna Kemell, Mikko Ritala, Jaan Aarik, 2010 .

Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

Jaan Aarik, Teet Uustare, Väino Sammelselg, 1996 .

DISORDERED STRUCTURE AND DENSITY OF GAP STATES IN HIGH-PERMITTIVITY THIN SOLID FILMS

Mikko Ritala, Jaan Aarik, Kaupo Kukli, 2006 .

Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

Jaan Aarik, Johannes Heitmann, Martti Pärs, 2008 .

Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

Jaan Aarik, Teet Uustare, Kaupo Kukli, 2001 .

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Jaan Aarik, Teet Uustare, Hugo Mändar, 2001 .

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Jaan Aarik, Aarne Kasikov, Hugo Mändar, 2006 .

Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures

Mikko Ritala, Jaan Aarik, Jun Lu, 2010 .

Anomalous effect of temperature on atomic layer deposition of titanium dioxide

Jaan Aarik, Hugo Mändar, Väino Sammelselg, 2000 .

Properties of tantalum oxide thin films grown by atomic layer deposition

Jaan Aarik, Teet Uustare, Kaupo Kukli, 1995 .