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HfO2/SiO2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy

Olivier Renault, P. Besson, François Martin, 2002 .

Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si

Olivier Renault, D. Blin, Anne-Marie Papon, 2003 .