M. Kurihara

Silicon Mold Etching with Hard Mask Stack Using Spherical Structure of Block Copolymer for Bit-Patterned Media with 2.8 Tbit/in.2

N. Negishi, M. Kurihara, M. Satake, 2013 .

Advanced Metrology and Single Reaction Control for Future Scaling

M. Kurihara, 2019, 2019 Electron Devices Technology and Manufacturing Conference (EDTM).

Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Hiroyuki Kobayashi, Nobuya Miyoshi, Masaru Izawa, 2017 .

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

Kenji Maeda, Masaru Hori, Hiroyuki Kobayashi, 2017 .

Effect of oxygen addition to an argon plasma on etching selectivity of poly(methyl methacrylate) to polystyrene

Hiroshi Yoshida, Yasuhiko Tada, Makoto Satake, 2013 .

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

M. Kurihara, Nobuya Miyoshi, M. Izawa, 2022, Journal of Vacuum Science & Technology A.