M. Satake

Silicon Mold Etching with Hard Mask Stack Using Spherical Structure of Block Copolymer for Bit-Patterned Media with 2.8 Tbit/in.2

N. Negishi, M. Kurihara, M. Satake, 2013 .

Degradation of perpendicular magnetic anisotropy in CoFeB film after H2 plasma irradiation

M. Satake, Masaki Yamada, 2016 .

Formation Mechanism of a Rounded SiGe-Etch-Front in an Isotropic Dry SiGe Etch Process for Gate-All-Around (GAA)-FETs

M. Satake, T. Iwase, H. Hamamura, 2021, 2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

Effect of oxygen addition to an argon plasma on etching selectivity of poly(methyl methacrylate) to polystyrene

Hiroshi Yoshida, Yasuhiko Tada, Makoto Satake, 2013 .

Formation Mechanism of Rounded SiGe-Etch Front in Isotropic SiGe Plasma Etching for Gate-All-Around FETs

M. Satake, T. Iwase, H. Hamamura, 2021, IEEE Journal of the Electron Devices Society.