Akihiro Nakae

发表

Fast and accurate optical proximity correction based on aerial image simulation

Shuji Nakao, Tetsuro Hanawa, Kazuya Kamon, 1996, Advanced Lithography.

Proposal for pattern layout rule in application of alternating phase-shift mask

Shuji Nakao, Akihiro Nakae, Yasuji Matsui, 1997, Photomask and Next Generation Lithography Mask Technology.

Ar ion implantation into resist for etching resistance improvement

Kouichirou Tsujita, Akihiro Nakae, Atsumi Yamaguchi, 2001, SPIE Advanced Lithography.

Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

Shuji Nakao, Akira Imai, Kazuyuki Suko, 2004, SPIE Advanced Lithography.

Influence of aberration on performance during use of resolution enhancement technology

Shuji Nakao, Kouichirou Tsujita, Akihiro Nakae, 1998, Advanced Lithography.

Reduction of mask-error effect utilizing pupil filter in alternative phase-shift lithography

Shuji Nakao, Kouichirou Tsujita, Akihiro Nakae, 1997, Advanced Lithography.

Relation between optical property of pattern image and adhesion of resist pattern

Kouichirou Tsujita, Akihiro Nakae, Junjiro Sakai, 2003, SPIE Advanced Lithography.

Application of super-diffraction lithography (SDL) for an actual device fabrication

Shuji Nakao, Shinroku Maejima, Kazuyuki Suko, 2006, SPIE Advanced Lithography.

A New Type of Tunnel-Effect Transistor Employing Internal Field Emission of Schottky Barrier Junction

Reiji Hattori, Akihiro Nakae, R. Hattori, 1992 .

Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask

Shuji Nakao, Kouichirou Tsujita, Akihiro Nakae, 1998 .

Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape

Shuji Nakao, Tetsuro Hanawa, Kazuya Kamon, 1996 .

Amorphous silicon TFT using Schottky barrier contacts for source and drain

Reiji Hattori, Akihiro Nakae, Junji Shirafuji, 1992 .

0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light

Shuji Nakao, Kouichirou Tsujita, Akihiro Nakae, 1999 .

Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask

Nobuyuki Yoshioka, Haruhiko Kusunose, Akihiro Nakae, 1994 .